Nickel Gate Valve

WDL Nickel Gate Valve provides full-bore on-off isolation with low pressure loss when open for caustic soda systems and alkali concentration equipment. Connections, trim and operation are selected to the project conditions.

Description

Nickel Gate Valve

WDL Nickel Gate Valve provides full-bore on-off isolation with low pressure loss when open for process systems that need resistance in caustic alkali and selected reducing or neutral media. Commercially pure Nickel 200/201 is commonly selected for caustic alkali and controlled reducing or neutral environments.

Design Options

ItemAvailable specification
MaterialNickel 200, Nickel 201 or project-specified nickel alloy
Functionfull-bore on-off isolation with low pressure loss when open
ConnectionsFlanged or butt-welded
OperationHandwheel, gearbox, pneumatic or electric actuator
Design basisAPI 600, API 603, API 6D or ASME B16.34

Typical Applications

  • Caustic soda systems
  • Alkali concentration equipment
  • High-purity process lines
  • Main process isolation
  • Full-bore pipeline service

Selection Notes

Nickel 201 is normally considered for higher-temperature exposure; oxidizing acids and sulfur-bearing media require another material review.

Gate valves are normally selected for isolation rather than continuous throttling; confirm wedge, seat and stem design.

Frequently Asked Questions

Why select Nickel 200/201 for this gate valve?

Commercially pure Nickel 200/201 is commonly selected for caustic alkali and controlled reducing or neutral environments. Final suitability depends on the complete process conditions and the selected valve trim.

What information is needed for selection?

Provide the size, pressure rating, medium composition, concentration, temperature, connection standard, operating method and required quantity.

Send the process datasheet to WDL for material review, dimensional confirmation and quotation.

Reviews

There are no reviews yet.

Be the first to review “Nickel Gate Valve”

Your email address will not be published. Required fields are marked *