Nickel Discharge Valve
WDL Nickel Discharge Valve provides controlled draining from reactors, vessels and process tanks for caustic soda systems and alkali concentration equipment. Connections, trim and operation are selected to the project conditions.
Description
Nickel Discharge Valve
WDL Nickel Discharge Valve provides controlled draining from reactors, vessels and process tanks for process systems that need resistance in caustic alkali and selected reducing or neutral media. Commercially pure Nickel 200/201 is commonly selected for caustic alkali and controlled reducing or neutral environments.
Design Options
| Item | Available specification |
|---|---|
| Material | Nickel 200, Nickel 201 or project-specified nickel alloy |
| Function | controlled draining from reactors, vessels and process tanks |
| Connections | Flanged or welded vessel and pipeline connections |
| Operation | Manual, pneumatic, electric or hydraulic actuator |
| Design basis | Project drawing, vessel interface and applicable pressure standard |
Typical Applications
- Caustic soda systems
- Alkali concentration equipment
- High-purity process lines
- Reactor bottom discharge
- Tank draining and batch transfer
Selection Notes
Nickel 201 is normally considered for higher-temperature exposure; oxidizing acids and sulfur-bearing media require another material review.
Confirm the mounting orientation, dead-space limit, crystallization tendency, solids size and vessel nozzle dimensions.
Frequently Asked Questions
Why select Nickel 200/201 for this discharge valve?
Commercially pure Nickel 200/201 is commonly selected for caustic alkali and controlled reducing or neutral environments. Final suitability depends on the complete process conditions and the selected valve trim.
What information is needed for selection?
Provide the size, pressure rating, medium composition, concentration, temperature, connection standard, operating method and required quantity.
Send the process datasheet to WDL for material review, dimensional confirmation and quotation.
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